About us
The Physical Vapour Deposition and Characterisation Facility includes the following key features:
Deposition:
- AJA Sputtering system: Highly versatile RF and DC magnetron sputtering system.
- Electron beam evaporator: Can grow high purity polycrystalline metallic films such as Au, Nb, Pt, V, Al, and Cu.
- Custom sputtering systems: The facility hosts four custom built DC magnetron sputtering systems.
Fabrication:
- Dual beam microscope: Zeiss Crossbeam 540 is a Dual Beam microscope which combines high resolution field emission scanning electron microscopy (FE-SEM) and advanced focussed ion beam (FIB) processing.
- Suss MJB3 Mask aligner and Argon ion miller: The argon ion miller allows for anisotropic and non-selective etching of devices. Suitable for metallic or insulating materials.
- Electron-beam lithography system: LEO /ZEISS 1455VP scanning electron microscope equipped with Raith Elphy Quantum for device fabrication.
Characterisation:
- Atomic force microscope: A Bruker Multimode 8 with Nanoscope 5 controller.
- Vibrating Sample Magnetometer: Lake Shore Cryotonics 8600 series vibrating sample magnetometer (VSM).
- Magnetic Property Measurement System (Quantum Design MPMS): This system uses superconducting magnets to reach up to 7 T, with a temperature range from 1.8 to 400 K. A Superconducting Quantum Interference Device (SQUID) allows for extremely accurate magnetic field sensing.
- 9 T cryo-free system: It uses a superconducting magnet to apply a maximum magnetic field corresponding to 9 T. Sample temperatures can reach 1.7 K to 315 K in its default operation. Samples can be loaded both in-plane and out-of-plane.
- Cryogenic DC/RF Probe station: Lake Shore Cryogenics CRX-6.5K
